NISE aims to explore and create materials with exotic properties that have impact both fundamental and technological, especially those materials can allow for novel memory and computing devices and technologies. A common theme underlying the projects in the NISE department is the creation of atomically engineered thin film materials with engineered properties. A particular focus is on heterostructures with interfaces that have emergent properties. The broad themes of NISE are spintronic, ionitronic and cognitive materials and devices. These artificial materials are created by the deposition of atomically thin films using techniques that include: magnetron and ion beam sputtering, pulsed laser deposition, molecular beam epitaxy, as well as by exfoliation of layered 2d compounds. Complex heterostructures are formed by using one or more of these techniques.
